ATC Orion 5 RF/DC Sputtering System (AJA International)
Main Deposition Chamber: 14.6" high x 12" OD, S/S vacuum chamber.
Con-Focal Sputtering: three 2'' magnetron sputter guns with integral isolation chimneys.
DC and RF Generators: two 300 Watt RF generators and one 750 Watt DC generator.
Quartz Crystal Thickness Monitor.
Substrate Holder: accommodates substrates up to 4" diameter; mounts to top of chamber for sputter up orientation; continous motorized rotation (0-40RPM) with controller; radiant heating to 850 C with quartz halogen lamps (+/- 1 degree C temp. stability); capable of being heated in an O2 environment;
Gas Handling: mass flow controlled gas line (Ar) - 20 sccm with pneumatic isolation valve(s) and filter.
Deposition Uniformity: typically +/- 2.5% thickness uniformity over a 4'' diameter substrates.
Base Chamber Vacuum: better than or equal to 3.0×10-8 Torr.
Savannah 100 ALD (UltraTech / Cambridge NanoTech)
Substrate Size: up to 200 mm
Substrate Temperature: 25°C - 500°C; ±0.2°C
Precursor Sources: Up to 6, heated
Deposition Uniformity: <±1%
Deposition: High speed/ultra high aspect ratio