The goal of this project is the development of a spark-assisted laser multicharged ion (MCI) deposition and implantation system capable of generating highly charged ions with ion charge and energy selectivity and multi-elemental capability. The energy deposited in the laser produced plasma, from a target material, is to be significantly amplified by coupling the laser plasma with spark discharge.
There are three basic methods for producing multi-charged ions include the Electron Beam Ion Trap (EBIT), Ion accelerators and laser generations.
EBIT: Electron gun with high current density is used to trap MCI
Ions accelerators: Uses EM fields to move particles at high speeds in defined beams which are directed towards a target creating collision induced ionization.
Laser generation: Laser ablation of a target and optimization of plasma using a spark discharge.
This new technology is expected to enhance the production of highly charged ions from laser plasma, provide a cost-effective add-on to existing pulsed laser deposition systems, generate pulsed source of MCI, and potentially reduce equipment cost and size compared to presently available electron cyclotron resonance and electron beam ion sources.
The development of the laser multicharged ion (LMCI) deposition and implantation system will enable new applications and research activities that depend on the MCI charge and kinetic energy selected.
Work is conducted to develop a spark-assisted laser multicharged ion (SA-LMCI) deposition and implantation system capable of generating highly charged ions with ion charge and energy selectivity.
Voltage detected on the Faraday cup due to positive ions is shown in fig.1 for different laser energy pulses applied to the AI target.